In February, 2011 LumArray delivered a ZP-150 maskless photolithography system to the National Institute of Standards and Technology (NIST), Gaithersburg, where it is being used to write computer-generated holograms and other nano-structured optics over 6 inch (150 mm) diameter substrates.

NIST is using LumArray's ZP-150 in its Semiconductor & Dimensional Metrology Division for the applications summarized in this flyer.

Please see NIST’s Semiconductor & Dimensional Metrology Division for more information.

Figure 1 shows the system installed in a clean room at NIST with an operator inputting data. Figure 2 shows the system within its environmental enclosure designed to maintain the temperature to 0.1C. Figure 3 is a micrograph of the central region of a Fresnel-zone pattern, written with the LumArray system at NIST. Such a Fresnel-zone pattern is the hologram of a point source.

Figure 1:

Photograph of LumArray’s ZP-150 maskless photolithography tool installed at NIST, with an operator inputting pattern data. Note the small footprint.

Figure 2:

Photograph of the ZP-150 within its environmental enclosure, designed to maintain the temperature within 0.1 degree C.

Figure 3:

Photograph of 75 mm-diameter computer-generated hologram written at NIST on the ZP-150 system