LumArray, Inc. is now offering lithographic services to complement our manufacturing of maskless photolithography systems.

Lithographic service is available using either our in-house ZP-150 maskless photolithography system or our Raith 150 scanning-electron-beam-lithography (SEBL) system. The ZP-150 employs zone-plate-array-lithography (ZPAL). It can write dense features down to 200 nm and cover substrates up to 150 mm diameter with a single continuous pattern, i.e., without "stitching."

In high-resolution resists such as PMMA and HSQ, the SEBL system is capable of writing features down to about 20 nm, depending on the resist thickness.