ZP-150A
Affordable, high-throughput high-resolution patterning emphasizing flexibility and ease of use for research, prototyping and low-volume manufacturing.
| Specifications | |
|---|---|
| Minimum Feature Size: | 150nm Dense, 120nm Isolated |
| Numerical Aperture: | NA=0.85 |
| Parallel Beams: | 1000 |
| Writing Speed: | 1.7mm2/sec (@0.85 NA) ~1hr per Ø100mm wafer, ~2hrs per Ø150mm wafer |
| Design Grid: | 1nm |
| Positioning Resolution: | 1.2nm |
| Maximum Pattern Area: | 150mm x150mm |
| Overlay: | <20nm |
| Field Size: | Unlimited |
| Wavelength: | 405nm (I-line, G-line compatible) |
| Minienvironment: | ISO Class 5 |
| Pattern Layout: | GDS II |
| Optimization: | MaskPlus PEC software |
| Tool Size: | 35" x53" x61" |