News
LumArray attended the Sematech Maskless-Lithography and Multibeam-Mask-Writer Workshop
New York City, NY
LumArray's presentation was entitled: "Scalable Maskless Photolithography."
Maskless Workshop Agenda.pdf
LumArray attends 2009 Lithography Workshop
Cour d'Alene, ID
The 19th Lithography Workshop which is being held at the world-renown
Coeur d'Alene Resort, in Coeur d'Alene, Idaho. With the support of its members, the
Lithography Workshop has sponsored a unique program which is carefully designed to
cover the latest lithography-related advancements to benefit all participants in their field
of expertise. The Workshop held its first meeting in lake Placid, New York in 1981. The
2009 Workshop is the 19th in a series of meetings that span 28 years promoting the
continuing evolution of lithography. The speakers at the Workshop are selected by
invitation and represent a broad range of disciplines including sources, masks, resists,
metrology and applications and covering a wide array of different lithography
approaches.
http://www.lithoworkshop.org/
LumArray attends the Nanomanufacturing Summit
Boston, MA
Presentation titled: "Zone-Plate Array Lithography: Enabling Nanotechnology from Research through Manufacturing".
http://www.internano.org/ocs/index.php/NMS/NMS2009/schedConf/overview
LumArray attends EIPBN
Marco Island, FL
Presentation titled: "Sculpting nanostructures with light".
The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brings together engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends.
http://www.eipbn.org/
LumArray's AMOL technology published in
Science Magazine
Article: Confining Light to Deep Subwavelength Dimensions to Enable Optical Nanopatterning
Additional AMOL publications:
D. Chandler, It's a fine line. New method could lead to narrower patterns
R. Ehrenberg, Double-laser approach makes one thin line
P. Rodgers, "What diffraction limit?," Nature Nanotechnology, Vol. 4, p. 280, May 2009.
J. Timmer, Using donut-shaped lasers to make smaller CPUs
S. Deffree, MIT patterning method could aid scaling
"MIT makes 36nm lines with intereference litho step," Solid State Technology, April 13, 2009.
LumArray attends SPIE Microlithography 2009
San Jose, CA
Presentation titled: "Advances in Zone-Plate Array Lithography: Photons vs. Electrons for Next Generation Lithography".
http://spie.org/x34306.xml