Lumarray is a lithography company with a state-of-the-art-patented technology, developed at MIT, that departs from a century old tradition of conventional optics.

Our technology, Zone-Plate-Array Lithography (ZPAL), integrates recent advances in microfabrication, micromechanics and fast computing to produce a lithography tool that will handle the lithographic needs of the decades to come.

LumArray, Inc. was founded in 2002, originally as an LLC and later converted to a corporation. It is a spinoff from the NanoStructures laboratory at MIT, which was founded in 1977 by Prof. Henry I. Smith, the President of LumArray, Inc. LumArray's expertise is derived from over 40 years of research on lithography at MIT, culminating in the invention and development of zone-plate-array lithography (ZPAL), the innovative technology upon which LumArray's product is based.

Management

Board of Directors

LumArray's Board of Directors includes: Dr. Nicholas P. Economou, Dr. Henry I. Smith, Dr. Rajesh Menon, Dr. Michael Walsh.

Dr. Henry I. Smith

President and Acting Chief Executive Officer

Henry I. Smith is the President and acting CEO of LumArray, as well as a Professor (retired from teaching) of Electrical Engineering at MIT and Associate Director of MIT's NanoStructures Lab. He and his co-workers are responsible for a number of innovations in nanostructures technology and applications including: comformable-photomask lithography, x-ray lithography, the phase-shift mask, the attenuating phase shifter, spatial-phase-locked e-beam lithography, achromatic-interference lithography, spatial-frequency doubling and coherent-diffraction lithography, immersion photolithography, zone-plate-array lithography, absorbance-modulation optical lithography, interferometric alignment, graphoepitaxy, subboundary entrainment, templated self-assembly, and a variety of quantum-effect, short-channel, single-electron, nanomagnetic, photonic-crystal and microphotonic devices. Prof. Smith is a Fellow of the American Academy of Arts and Sciences, the IEEE and the OSA. He is a member of the National Academy of Engineering, the APS, AVS, MRS, and Sigma Xi. He holds over 40 US patents and has published over 400 technical articles.

Dr. Rajesh Menon

Co-founder

Rajesh Menon's research intersects optics and nanotechnology, with foci on extending the spatial resolution of optics to the nanoscale, and the application of optics in energy. To date, his research has led to 42 technical articles, 17 patents, and a spin-off company. He has led projects in nanopatterning and nanoscopy with support from DARPA, the NSF and the MIT Deshpande Center for Technological Innovation. From 2004 to 2009, Rajesh was the Chief Technology Officer of LumArray, Inc. Starting August 2009, Rajesh will be the USTAR Assistant Professor of Electrical and Computer Engineering at the University of Utah. A native of Kerala, India, Rajesh received his B.Eng (1998) degree with first class honors from Nanyang Technological University (NTU) in Singapore under a full scholarship. Subsequently, he came to MIT on the NTU overseas scholarship, where he received his S.M (2000) and Ph.D (2003) degrees.

Dr. Michael Walsh

Vice President of Engineering

Michael E. Walsh received his Ph.D (2004) and M.S. (2000) degrees from the Massachusetts Institute of Technology. He is currently managing the development of LumArray's prototype zone-plate-array lithography system. His doctoral thesis, entitled "On the design of lithographic interferometers and their application", contains numerous novel technical and theoretical advances in the field of high-resolution optical lithography, including the correction of systematic aberrations, novel high-resolution photoresist processes, and solid-immersion interference lithography. He has applied these advancements to the fabrication of a variety of devices including magnetic-random-access memories, DFB lasers, and self-assembled systems. He is the author of more than 12 technical articles and 2 patents in the fields of advanced lithography and the fabrication of nanostructures.

Dr. Feng Zhang

Vice President of Research

Feng Zhang received his Ph.D. degree from the Massachusetts Institute of Technology (MIT) in 2005. He is the author of more than 5 technical articles and 1 patent in the fields of advanced lithography and fabrication processes. During his research in the NanoStructures Laboratory at MIT, Dr. Zhang had pursued a novel technology for enabling nanometer-level placement accuracy in scanning-electron-beam lithography. He developed two of the key components in this new technology, one was the ultra-fast electron-beam-current modulator, and the other the fabrication process of a high secondary-electron-yield reference grid. After joining LumArray, Dr. Zhang has been responsible for developing a software product for optical-proximity correction for direct-write lithography tools, such as mask writers and zone-plate-array lithography tools. He is currently developing the data-transferring system for direct-write lithography tools. This is one of the most significant engineering challenges that all high-throughput direct-write lithography tools will face.